Article Abstract

Student Paper: Arsenic Exposure in Gallium Arsenide Device Manufacturing: An Evaluation of Control Methods during Molecular Beam Epitaxy (MBE) Maintenance
Sara Ash ; University of California at Berkeley, School of Public Health, Industrial Hygiene Graduate Program

Special hazards exist during maintenance of Molecular Beam Epitaxy (MBE) systems used for GaAs device manufacturing when the reactor chamber must be accessed. This paper summarizes an arsenic exposure evaluation conducted during a maintenance task on a MBE system on the University of California at Berkeley campus and describes some exposure control methods that are used in industry and academic settings. Ten recommendations to reduce arsenic exposure during MBE maintenance tasks are provided that can be used in R&D and academic settings, such as the UC Berkeley Integrated Materials Laboratory where exposure monitoring was conducted.


Articles indicated as Student Papers are from the top three submitted papers from the SESHA Academic Program Scholarship Awards. These papers were reviewed by the SESHA Academic Committee for originality, content, relevance, style, and contribution; and represents one piece of the evaluation process for awarding of the scholarship. Student papers HAVE NOT undergone the standard peer review process; therefore, the reader should use his or her judgment regarding the content and any recommendation the student author has made. If you have comments, questions, or feedback about the paper please feel free to submit them to journal@seshaonline.org and the information will be communicated to the student and their academic advisor.



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