Study: Chemical Efficiency Comparison Between A Spray Tool And A Wet
Sink For An RCA Clean
Jeff Glick - Advanced Micro Devices , Jenna Latt - Advanced Micro Devices (SSA Journal Volume 10 Number 1 - Spring 1996 pp. 43 - 47 )
As integrated circuit wafer production continues to grow and wafer fabrication facilities are operating at capacity, methods to increase production by decreasing cycle times and reducing production costs become increasingly important. Chemical conservation can be integrated into the design and operation of production tools. Advanced Micro Devices (AMD), performed a case study to compare the chemical efficiencies of an FSI MP Mercury spray tool and an automated wet sink. Both tools are used for RCA pre-diffusion cleans. Chemical consumption was evaluated for hydrochloric acid, hydrogen peroxide, and ammonium hydroxide on a liter per lot basis for both types of wet clean tools. Tool efficiencies were compared over a 24-hour period. Results indicated that the spray tool uses chemicals more efficiently than traditional immersion baths. Less chemicals were used on a per lot basis resulting in a more cost-effective clean. The variables evaluated in the study included chemical spiking, bath lifetime, and wafer loading.