SESHA 2019 Symposium Abstract

Fate of HBr during F-GHG Abatement

Joe Van Gompel; Jim L\\\'Heureux; Michael Larsen
(Applied Materials, Santa Clara CA)

Some semiconductor etch processes utilize HBr or a combination of HBr + Cl2, along with fluorinated greenhouse gases (F-GHGs) such as SF6, CF4, and others. Burn-wet abatement is commonly used to destroy the F-GHGs. A new abatement approach will be discussed for abatement of these materials.