SESHA 2019 Symposium Abstract

Reducing CF4-Emissions by smart control of abatement parameters

Andreas Frenzel
(DAS Environmental Expert GmbH)

Combustion is the most common treatment for removal of PFCs from waste gas of semiconductor etch processes. Combustion is also employed for treatment of CVD process waste gas, where CF4 may appear as a by-product of chamber cleaning chemistry. Smart setting of abatement system burner conditions allows to reduce CF4 emissions in both types of processes. Presently communication from the process tool allows only switching between high and low burner settings. Based on results from laboratory tests we want to discuss how smart control of the abatement system, using communication of actual process conditions, may help to reduce emissions and save energy.